Photodarkening and dopant segregation in Cu-doped β-Ga2O3 Czochralski single crystals
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作者:
Jesenovec, Jani
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Washington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Jesenovec, Jani
[1
,2
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Remple, Cassandra
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Washington State Univ, Dept Phys & Astron, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Remple, Cassandra
[3
]
Huso, Jesse
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Klar Sci, Pullman, WA 99163 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Huso, Jesse
[4
]
Dutton, Benjamin
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Washington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Dutton, Benjamin
[1
,2
]
Toews, Parker
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Washington State Univ, Inst Mat Res, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Toews, Parker
[1
]
McCluskey, Matthew D.
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Washington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USA
Washington State Univ, Dept Phys & Astron, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
McCluskey, Matthew D.
[1
,2
,3
]
McCloy, John S.
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Washington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
McCloy, John S.
[1
,2
]
机构:
[1] Washington State Univ, Inst Mat Res, Pullman, WA 99164 USA
[2] Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USA
[3] Washington State Univ, Dept Phys & Astron, Pullman, WA 99164 USA
beta-Ga2O3 has demonstrated insulating properties with Mg, Fe, and Zn acceptor doping. Here we investigate Cu doping (0.25 at.%) in bulk Czochralski (CZ) and vertical gradient freeze (VGF) beta-Ga2O3, with significant Cu incorporation, even with the expected Cu evaporation. Representative crystals were assessed for orientation, purity, optical, and electrical properties. The solubility and electronic behavior of Cu dopants are consistent with measured concentrations of 1 x 1018-1 x 1019 atoms/cm3 and electrical measurements that show high resistivities of 109-1010 omega center dot cm. Segregation and precipitation of Cu species in part of the VGF material was determined to be Cu2O by analysis with Raman spectroscopy, photoluminescence microscopy, energy-dispersive X-ray spectroscopy, and laser ablation inductively coupled plasma mass spectrometry. With sufficient Cu concentration, beta-Ga2O3 crystals excited with deep ultraviolet light photodarken rapidly and exhibit decreased resistivity. This darkened state remains at room temperature for several days before decaying.
机构:
Washington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Jesenovec, Jani
Varley, Joel
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Lawrence Livermore Natl Lab, Livermore, CA 94450 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Varley, Joel
Karcher, Samuel E.
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Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Karcher, Samuel E.
McCloy, John S.
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Washington State Univ, Inst Mat Res, Pullman, WA 99164 USA
Washington State Univ, Mat Sci & Engn Program, Pullman, WA 99164 USAWashington State Univ, Inst Mat Res, Pullman, WA 99164 USA
机构:
Tokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Kogakuin Univ, Grad Sch Engn, Dept Elect Engn & Elect, Hachioji, Tokyo 1920015, Japan
Natl Inst Informat & Commun Technol, Koganei, Tokyo 1848795, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Onuma, T.
Fujioka, S.
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机构:
Kogakuin Univ, Grad Sch Engn, Dept Elect Engn & Elect, Hachioji, Tokyo 1920015, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Fujioka, S.
Yamaguchi, T.
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Kogakuin Univ, Grad Sch Engn, Dept Elect Engn & Elect, Hachioji, Tokyo 1920015, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Yamaguchi, T.
Itoh, Y.
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机构:
Kogakuin Univ, Dept Appl Chem, Hachioji, Tokyo 1920015, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Itoh, Y.
Higashiwaki, M.
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Natl Inst Informat & Commun Technol, Koganei, Tokyo 1848795, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Higashiwaki, M.
Sasaki, K.
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机构:
Natl Inst Informat & Commun Technol, Koganei, Tokyo 1848795, Japan
Tamura Corp, Sayama, Saitama 3501328, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Sasaki, K.
Masui, T.
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Koha Co Ltd, Tokyo 1760022, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan
Masui, T.
Honda, T.
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机构:
Kogakuin Univ, Grad Sch Engn, Dept Elect Engn & Elect, Hachioji, Tokyo 1920015, JapanTokyo Natl Coll Technol, Dept Liberal Arts, Hachioji, Tokyo 1930997, Japan