Quantum-Cascade-Laser Active Regions on Metamorphic Buffer Layers

被引:2
作者
Mawst, L. J. [1 ]
Rajeev, A. [1 ]
Kirch, J. D. [1 ]
Kim, T. W. [1 ]
Botez, D. [1 ]
Zutter, B. [2 ]
Buelow, P. [2 ]
Schulte, K. [2 ]
Kuech, T. F. [2 ]
Wood, A. [3 ]
Babcock, S. E. [3 ]
Earles, T. [4 ]
机构
[1] Univ Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
[2] Univ Wisconsin, Dept Chem & Biol Engn, Madison, WI 53706 USA
[3] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA
[4] Intraband LLC, Madison, WI USA
来源
QUANTUM SENSING AND NANOPHOTONIC DEVICES XII | 2015年 / 9370卷
基金
美国国家科学基金会;
关键词
QCL; metamorphic buffer layer; semiconductor laser; MOCVD; MU-M; LOW-STRAIN; GROWTH;
D O I
10.1117/12.2075457
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Strained-layer superlattice (SL) structures have been grown by metalorganic vapor phase epitaxy (MOVPE) on metamorphic buffer layers (MBLs) for application in intersubband-transition devices, such as quantum cascade lasers. Using the MBL as an adjustable lattice-parameter platform, we have designed relatively-low-strain quantum-cascade-laser structures that will emit in the 3.0-3.5 mu m wavelength range while suppressing carrier leakage from the upper laser level. Thick (10-12 mu m) compositionally-graded, hydride-vapor-phase-epitaxy (HVPE)-grown MBL structures are employed. To improve the planarity of the MBL surface, we employ chemical mechanical polishing (CMP) followed by wet chemical etching prior to the growth of the SL/device structures. We find that the wet-chemical etching step is crucial to remove residual damage introduced during CMP. 20-period InxGa1-xAs (wells)/AlyIn1-yAs (barriers) SLs grown on the MBLs are characterized by x-ray diffraction (XRD). Intersubband electroluminescence emission is observed in the 3.5 mu m wavelength range from devices employing such SL structures.
引用
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页数:15
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