Recent progress in optoelectronic applications of hybrid 2D/3D silicon-based heterostructures

被引:15
作者
Zhou, Jingshu [1 ,2 ]
Xin, Kaiyao [1 ]
Zhao, Xiangkai [3 ]
Li, Dongmei [3 ]
Wei, Zhongming [1 ]
Xia, Jianbai [1 ]
机构
[1] Chinese Acad Sci, State Key Lab Superlattices & Microstruct, Inst Semicond, Beijing 100083, Peoples R China
[2] Univ Chinese Acad Sci, Sch Elect Elect & Commun Engn, Beijing 100049, Peoples R China
[3] Chinese Acad Sci, Inst Semicond, Optoelect Syst Lab, Beijing 10083, Peoples R China
基金
中国国家自然科学基金;
关键词
silicon; 2D/3D; hybrid heterostructure; optoelectronic application; DEEP-ULTRAVIOLET PHOTODETECTOR; IN-SITU FABRICATION; BROAD-BAND; ENHANCED PHOTORESPONSIVITY; GRAPHENE PHOTODETECTOR; LIQUID EXFOLIATION; HIGH-DETECTIVITY; MOS2; HETEROJUNCTION; MONOLAYER;
D O I
10.1007/s40843-021-1939-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Silicon-based semiconductor technology has made great breakthroughs in the past few decades, but it is reaching the physical limits of Moore's law. In recent years, the presence of two-dimensional (2D) materials was regarded as an opportunity to break the limitation of traditional silicon-based optoelectronic devices owing to their special structure and superior properties. In consideration of the widely studied hybrid integration of 2D material detectors and 3D silicon-based systems, in this paper, the basic properties of several 2D materials used in photodetectors are summarized. Subsequently, the progress in silicon photonic integrated photo-detectors based on 2D materials is reviewed, followed by the summarization of the device structure and main performances. Then, the combination of some other traditional and 2D devices is discussed as a supplement. Finally, the prospective development of the hybrid 2D/3D silicon-based heterostructures is expected.
引用
收藏
页码:876 / 895
页数:20
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