Design considerations for CMOS digital circuits with improved hot-carrier reliability

被引:29
作者
Leblebici, Y
机构
[1] Dept. of Elec. and Electronics Eng., Istanbul Technical University, 80626 Maslak, Istanbul
关键词
D O I
10.1109/4.508215
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The hot-carrier induced degradation of the transient circuit performance in CMOS digital circuit structures is investigated and modeled, Delay-time degradation as a result of transistor aging, as opposed to current degradation, is devised as a more realistic measure of long-term circuit reliability, It is shown that for a wide class of circuits, the performance degradation due to dynamic hot-carrier effects can be expressed as a function of the nMOS and pMOS transistor channel widths, and the output load capacitance, In addition, the influence of the parasitic gate-drain overlap capacitance and the resulting drain voltage overshoot upon aging characteristics is investigated, The degradation of tapered (scaled) inverter chains is modeled, and a simple design guideline based on the scaling factor (F) and the transistor aspect ratio (r) is presented for the improvement of long-term reliability in scaled buffer structures with respect to hot-carrier induced device aging, Also, a number of simple design rules based on device geometry, circuit topology and power supply voltage are presented to ensure hot-carrier reliability.
引用
收藏
页码:1014 / 1024
页数:11
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