Growth and Characterization of p-InGaN/i-InGaN/n-GaN Double-Heterojunction Solar Cells on Patterned Sapphire Substrates

被引:23
作者
Chu, Mu-Tao [1 ]
Liao, Wen-Yih [2 ]
Horng, Ray-Hua [1 ,3 ]
Tsai, Tsung-Yen [4 ]
Wu, Tsai-Bau [3 ]
Liu, Shu-Ping [1 ]
Wu, Ming-Hsien [2 ]
Lin, Ray-Ming [5 ]
机构
[1] Natl Chung Hsing Univ, Grad Inst Precis Engn, Taichung 402, Taiwan
[2] Ind Technol Res Inst, Elect & Optoelect Res Labs, Hsinchu 301, Taiwan
[3] Natl Cheng Kung Univ, Dept Electroopt Engn, Tainan 701, Taiwan
[4] Natl Chung Hsing Univ, Dept Mat Sci & Engn, Taichung 402, Taiwan
[5] Chang Gung Univ, Dept Elect Engn, Tao Yuan 333, Taiwan
关键词
Edge-dislocation density; InGaN solar cell; light absorption; patterned sapphire; IMBEDDED ELECTRODES; EFFICIENCY; DIODES;
D O I
10.1109/LED.2011.2144954
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, InGaN-based solar cells with a p-InGaN/i-InGaN/n-GaN double-heterojunction structure were fabricated and characterized. Two kinds of sapphire substrates [i.e., a conventional sapphire substrate (CSS) and a patterned sapphire substrate (PSS)] were used for epitaxial growth. Both the solar cells grown on the CSS and the PSS demonstrated a high open-circuit voltage of 2.05 and 2.08 V, respectively. However, the short-circuit current of the solar cells grown on the PSS showed an improvement of 27.6% compared with that of the cells grown on the CSS. Such observation could be attributed to low edge-dislocation density and the increase in the light-absorption path by the scattering of interface incident light between the substrate and the epitaxial layer for the solar cell grown on the PSS.
引用
收藏
页码:922 / 924
页数:3
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