High air stability of threshold voltage on gate bias stress in pentacene TFTs with a hydroxyl-free and amorphous fluoropolymer as gate insulators

被引:93
|
作者
Umeda, Tokiyoshi [1 ]
Kumaki, Daisuke [2 ]
Tokito, Shizuo [1 ]
机构
[1] NHK Japan Broadcasting Corp, Setagaya Ku, Tokyo 1578510, Japan
[2] Tokyo Inst Technol, Dept Elect Chem, Midori Ku, Yokohama, Kanagawa 2268502, Japan
关键词
organic thin-film transistor; amorphous fluoropolymer; Cytop; air stable threshold voltage; bias stress; hysteresis; insulating properties;
D O I
10.1016/j.orgel.2008.02.015
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigated the air stabilities of threshold voltages(V-th) on gate bias stress in pentacene thin-film transistors (TFTs) with a hydroxyl-free and amorphous fluoropolymer as gate insulators. The 40-nm-thick thin films of spin-coated fluoropolymer had excellent electrical insulating properties, and the pentacene TFTs exhibited negligible current hysteresis, low leakage current, a field-effect mobility of 0.45 cm(2)/Vs and an on/off current ratio of 3 x 10(7) when it was operated at -20 V in ambient air. After a gate bias stress of 10(4) s, a small Vth shift below 1.1 V was obtained despite non-passivation of the pentacene layer. We have discussed that the excellent air stability of V,1, was attributed to the insulator surface without hydroxyl groups. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:545 / 549
页数:5
相关论文
共 50 条
  • [1] Gate Bias Stress-Induced Threshold Voltage Shift Effect of a-IGZO TFTs with Cu Gate
    Liu, Xiang
    Wang, Lisa Ling
    Ning, Ce
    Hu, Hehe
    Yang, Wei
    Wang, Ke
    Yoo, Seong Yeol
    Zhang, Shengdong
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (12) : 4299 - 4303
  • [2] Markov model for threshold-voltage shift in amorphous silicon TFTs for variable gate bias
    Sambandan, S
    Zhu, L
    Striakhilev, D
    Servati, P
    Nathan, A
    IEEE ELECTRON DEVICE LETTERS, 2005, 26 (06) : 375 - 377
  • [3] Localization of gate bias induced threshold voltage degradation in a-Si:H TFTs
    Shringarpure, Rahul
    Venugopal, Sameer
    Clark, Lawrence T.
    Allee, David R.
    Bawolek, Edward
    IEEE ELECTRON DEVICE LETTERS, 2008, 29 (01) : 93 - 95
  • [4] Improving resistance to gate bias stress in pentacene TFTs with optimally cured polymer dielectric layers
    Hwang, DK
    Park, JH
    Lee, J
    Choi, JM
    Kim, JH
    Kim, E
    Im, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2006, 153 (01) : G23 - G26
  • [5] Threshold voltage shift prediction for gate bias stress on amorphous InGaZnO thin film transistors
    Park, Suehye
    Cho, Edward Namkyu
    Yun, Ilgu
    MICROELECTRONICS RELIABILITY, 2012, 52 (9-10) : 2215 - 2219
  • [6] Drain-bias dependence of threshold voltage stability of amorphous silicon TFTs
    Karim, KS
    Nathan, A
    Hack, M
    Milne, WI
    IEEE ELECTRON DEVICE LETTERS, 2004, 25 (04) : 188 - 190
  • [7] Constant bias stress effects on threshold voltage of pentacene thin-film transistors employing polyvinylphenol gate dielectric
    Kim, Tae Ho
    Song, Chung Kun
    Park, Jin Seong
    Suh, Min Chul
    IEEE ELECTRON DEVICE LETTERS, 2007, 28 (10) : 874 - 876
  • [8] Instability of threshold voltage under constant bias stress in pentacene thin film transistors employing polyvinylphenol gate dielectric
    Kim, Tae Ho
    Han, Chang Gi
    Song, Chung Kun
    THIN SOLID FILMS, 2008, 516 (06) : 1232 - 1236
  • [9] Gate-Drain-Bias Stress Study of Amorphous In-Ga-Zn-O TFTs
    Wu, Chen-Yi
    Kao, Yih-Chyun
    Huang, Chun-Yao
    Lin, Chun-Nan
    Chen, Chien Hung
    IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2010, : 793 - 794
  • [10] Negative threshold voltage shift for LTPS TFTs under x-ray irradiation and gate bias
    Tai, Ya-Hsiang
    Yeh, Shan
    Chan, Po-Chun
    Li, Yi-Shen
    Huang, Shih-Hsuan
    Tu, Cheng-Che
    Chang, Ting-Chang
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2019, 34 (09)