Multivariate Approach for Equipment Health Monitoring

被引:2
作者
Krauel, Christopher [1 ]
Weishaeupl, Laura [1 ]
机构
[1] Fraunhofer Inst Integrated Syst & Device Technol, Erlangen, Germany
来源
IFAC PAPERSONLINE | 2016年 / 49卷 / 12期
关键词
Monitoring; Equipment Health Factor; Semiconductor; Feature Selection; Condition Monitoring; FAULT-DETECTION; DIAGNOSIS;
D O I
10.1016/j.ifacol.2016.07.858
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
This paper deals with a method for equipment health monitoring through a multivariate approach. The approach concentrates on the autonomous classification of different process variable types which are defined by particular variable behaviors and the investigation of specified statistical feature extraction methods for every respective class. Also the computation of the equipment health factor (EHF) is presented. We provide a general method for detection of unknown failures through a multivariate approach to minimize production costs while still maintaining high yield. (C) 2016, IFAC (International Federation of Automatic Control) Hosting by Elsevier Ltd. All rights reserved.
引用
收藏
页码:716 / 720
页数:5
相关论文
共 12 条
  • [1] Berndt DJ, 1994, KDD WORKSH SEATTL WA, P359
  • [2] MONITORING AND DIAGNOSIS OF PLASMA ETCH PROCESSES
    DOLINS, SB
    SRIVASTAVA, A
    FLINCHBAUGH, BE
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1988, 1 (01) : 23 - 27
  • [3] Guo R. S., 1988, SEM MAN TECHN WORKSH, P111
  • [4] Synchronization of batch trajectories using dynamic time warping
    Kassidas, A
    MacGregor, JF
    Taylor, PA
    [J]. AICHE JOURNAL, 1998, 44 (04) : 864 - 875
  • [5] Structural Feature-Based Fault-Detection Approach for the Recipes of Similar Products
    Ko, Jong Myoung
    Kim, Chang Ouk
    Lee, Seung Jun
    Hong, Joo Pyo
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2010, 23 (02) : 273 - 283
  • [6] A wavelet-based procedure for process fault detection
    Lada, EK
    Lu, JC
    Wilson, JR
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2002, 15 (01) : 79 - 90
  • [7] Statistical Comparison of Fault Detection Models for Semiconductor Manufacturing Processes
    Lee, Taehyung
    Kim, Chang Ouk
    [J]. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2015, 28 (01) : 80 - 91
  • [8] Montgomery S., 2000, FUTURE FAB INT, V8
  • [9] Fault Diagnosis in Semiconductor Etch Equipment Using Bayesian Networks
    Nawaz, Javeria Muhammad
    Arshad, Muhammad Zeeshan
    Hong, Sang Jeen
    [J]. JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, 2014, 14 (02) : 252 - 261
  • [10] MONITORING BATCH PROCESSES USING MULTIWAY PRINCIPAL COMPONENT ANALYSIS
    NOMIKOS, P
    MACGREGOR, JF
    [J]. AICHE JOURNAL, 1994, 40 (08) : 1361 - 1375