Investigation on the structure and properties of AlxCr1-xN coatings deposited by reactive magnetron co-sputtering

被引：17

作者：

Wang, X. ^{[1
]}

Wang, L. S. ^{[1
]}

Qi, Z. B. ^{[2
]}

Yue, G. H. ^{[1
]}

Chen, Y. Z. ^{[1
]}

Wang, Z. C. ^{[2
]}

Peng, D. L. ^{[1
]}

机构：

[1] Xiamen Univ, Dept Mat Sci & Engn, Coll Mat, Xiamen 361005, Peoples R China

[2] Xiamen Univ, Dept Chem & Chem Engn, Xiamen 361005, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2010年 / 502卷 / 01期

基金：

中国国家自然科学基金;

关键词：

AlxCr1-xN coatings; Vapor deposition; N-2 flow rate; Working pressure; Microstructure; Hardness; CATHODIC ARC EVAPORATION; AB-INITIO; SPINODAL DECOMPOSITION; NANOCOMPOSITE COATINGS; MECHANICAL-PROPERTIES; SPUTTERING METHOD; PHASE-TRANSITION; THIN-FILMS; MICROSTRUCTURE; CR-1-XALXN;

D O I：

10.1016/j.jallcom.2010.04.155

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Al-rich AlxCr1-xN coatings have been deposited by reactive magnetron co-sputtering using a direct current (DC) power source to Al and a radio frequency (RF) power source to Cr target. The crystal structure, chemical composition, surface morphology, thickness and hardness of the AlxCr1-xN coatings which were prepared at various N-2 flow rates and working pressures have been systemically investigated. The results show a strong effect of N-2 flow rates and working pressures on the phase composition and microstructure as well as the Al content in AlxCr1-xN coatings. The present results also show Al contents play an important role in the hardness of the AlxCr1-xN coatings, which demonstrates the highest hardness for Al contents close to the maximum solubility in cubic AlxCr1-xN. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：243 / 249

页数：7

共 21 条

[1] A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings
Barshilia, Harish C.
Selvakumar, N.
Deepthi, B.
Rajam, K. S.
[J]. SURFACE & COATINGS TECHNOLOGY, 2006, 201 (06) : 2193 - 2201
[2] Compositional and structural evolution of sputtered Ti-Al-N
Chen, Li
Moser, Martin
Du, Yong
Mayrhofer, Paul H.
[J]. THIN SOLID FILMS, 2009, 517 (24) : 6635 - 6641
[3] Interplay of microstructural features in Cr1-xAlxN and Cr1-x-yAlxSiyN nanocomposite coatings deposited by cathodic arc evaporation
Dopita, M.
Rafaja, D.
Wuestefeld, Ch.
Ruzicka, M.
Klemm, V.
Heger, D.
Schreiber, G.
Sima, M.
[J]. SURFACE & COATINGS TECHNOLOGY, 2008, 202 (14) : 3199 - 3207
[4] Determination of the local environment of silicon and the microstructure of quaternary CrAl(Si)N films
Endrino, J. L.
Palacin, S.
Aguirre, M. H.
Gutierrez, A.
Schaefers, F.
[J]. ACTA MATERIALIA, 2007, 55 (06) : 2129 - 2135
[5] Pathways of atomistic processes on TiN(001) and (111) surfaces during film growth:: an ab initio study
Gall, D
Kodambaka, S
Wall, MA
Petrov, I
Greene, JE
[J]. JOURNAL OF APPLIED PHYSICS, 2003, 93 (11) : 9086 - 9094
[6] Relationship between hardness and grain size in electrodeposited copper films
Hakamada, Masataka
Nakamoto, Yoshiaki
Matsumoto, Hiroshi
Iwasaki, Hajime
Chen, Youqing
Kusuda, Hiromu
Mabuchi, Mamoru
[J]. MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 457 (1-2): : 120 - 126
[7] Pressure-dependent stability of cubic and wurtzite phases within the TiN-AlN and CrN-AlN systems
Holec, David
Rovere, Florian
Mayrhofer, Paul H.
Barna, Peter B.
[J]. SCRIPTA MATERIALIA, 2010, 62 (06) : 349 - 352
[8] Influence of hollow cathode plasma on AlCrN-thin film deposition with vacuum arc evaporation sources
Holzherr, M.
Falz, M.
Schmidt, T.
[J]. SURFACE & COATINGS TECHNOLOGY, 2008, 203 (5-7) : 505 - 509
[9] Effects of the thickness of Ti buffer layer on the mechanical properties of TiN coatings
Kim, GS
Lee, SY
Hahn, JH
Lee, BY
Han, JG
Lee, JH
Lee, SY
[J]. SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3) : 83 - 90
[10] Microstructure and mechanical properties of AlCrN films deposited by CFUBMS
Kim, Gwang Seok
Lee, Sang Yul
[J]. SURFACE & COATINGS TECHNOLOGY, 2006, 201 (07) : 4361 - 4366

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