Sputtering with gas cluster-ion beams

被引：9
作者：
Matsuo, J [1 ]
Akizuki, M [1 ]
Northby, J [1 ]
Takaoka, GH [1 ]
Yamada, I [1 ]
机构：
[1] SANYO ELECT CORP,MICROELECT RES CTR,GIFU 50301,JAPAN
来源：
SURFACE REVIEW AND LETTERS | 1996年 / 3卷 / 01期
关键词：
D O I：
10.1142/S0218625X96001820
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A high-current (similar to 100 nA) cluster-ion-beam equipment with a new mass filter has been developed to study the energetic cluster-bombardment effects on solid surfaces. A dramatic reduction of Cu concentration on silicon surfaces has been achieved by 20-keV Ar cluster (N similar to 3000) ion bombardment. The removal rate of Cu with cluster ions is two orders of magnitude higher than that with monomer ions. A significantly higher sputtering yield is expected for cluster-ion irradiation. An energetic cluster-ion beam is quite suitable for removal of metal.
引用
收藏
页码：1017 / 1021
页数：5
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