Gas aggregation nanocluster source - Reactive sputter deposition of copper and titanium nanoclusters

被引：51
|
作者：
Marek, Ales [1 ]
Valter, Jan [1 ]
Kadlec, Stanislav [1 ]
Vyskocil, Jiri [1 ]
机构：
[1] HVM Plasma Spol Sro, Prague 15800, Czech Republic
来源：
SURFACE & COATINGS TECHNOLOGY | 2011年 / 205卷
关键词：
Nanocluster; Reactive sputtering; Cluster formation; Gas aggregation; CLUSTER; GROWTH;
D O I：
10.1016/j.surfcoat.2010.12.027
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Copper and titanium nanoclusters in Ar and in Ar+O(2) gas mixtures were prepared using a magnetron based gas aggregation cluster source designed for Ultra High Vacuum operation. A considerable influence of oxygen addition on the formation of clusters was observed even at oxygen-to-argon admixture levels of the order of 1:1000. A quadrupole mass filter determined nanocluster size distribution while the total deposition rate was determined by quartz crystal measurements. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：S573 / S576
页数：4
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