Photolithographically patterned silver nanowire electrodeposition

被引:10
作者
Kung, S. C. [1 ]
Xing, W. [1 ]
Donavan, K. C. [1 ]
Yang, F. [1 ]
Penner, R. M. [1 ]
机构
[1] Univ Calif Irvine, Dept Chem, Irvine, CA 92697 USA
基金
美国国家科学基金会;
关键词
Silver; Nanowire; Metal; Electrodeposition; Polycrystalline; Photolithography; ENHANCED RAMAN-SCATTERING; METAL NANOWIRES; AMINE VAPOR; ARRAYS; TEMPLATES;
D O I
10.1016/j.electacta.2010.02.075
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We report the fabrication of silver nanowires using lithographically patterned nanowire electrodeposition (LPNE) The LPNE synthesis of silver nanowires proceeds by lithographically patterning and then etching an evaporated nickel film to produce a nickel nanoband 20-80 nm in height This nanoband which traces the perimeter of the exposed region is recessed by approximate to 500 nm into the photoresist producing a horizontal trench A silver nanowire of controlled height and width is formed within this trench by electrodepositing silver from either of two aqueous solutions at the nickel nanoband Silver nanowires with controlled widths ranging from 100 to 400 nm were obtained and the height of silver nanowires was independently controllable over the range from 20 to 80 nm The LPNE process is wafer-scale and continuous silver nanowires millimeters in length are readily obtained Data for the characterization of these nanowires using AFM TEM and XRD is presented (C) 2010 Elsevier Ltd All rights reserved
引用
收藏
页码:8074 / 8080
页数:7
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