Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants

被引:2
作者
Redzheb, Murad [1 ]
Okudur, Oguzhan Orkut [1 ,2 ]
Bernstorff, Sigrid [3 ]
Juraic, Krunoslav [4 ,5 ]
Van der Voort, Pascal [6 ]
Armini, Silvia [1 ]
机构
[1] Kapeldreef 75, B-3001 Leuven, Belgium
[2] Katholieke Univ Leuven, Dept Mat Engn, B-3000 Leuven, Belgium
[3] Elettra Sincrotrone Trieste, Str Statale 14,Km 163-5, I-34149 Basovizza, TS, Italy
[4] Graz Univ Technol, Inst Inorgan Chem, Stremayrgasse 9-4, A-8010 Graz, Austria
[5] Rudjer Boskovic Inst, Bijenicka C 54, Zagreb 10000, Croatia
[6] Univ Ghent, COMOC, Dept Inorgan & Phys Chem, Krijgslaan 281 S3, B-9000 Ghent, Belgium
关键词
Gemini surfactants; mesoporous materials; organosilica; self-assembly; thin films; DIELECTRIC-CONSTANT; ELASTIC-MODULUS; THIN-FILMS; POROSITY; PMOS;
D O I
10.1002/cphc.201800341
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation-induced self-assembly of 1,2-bis(triethoxysilyl)ethane and an ionic Gemini 16-12-16 surfactant under acidic conditions. The films were characterized by Fourier-transform infrared spectroscopy, grazing-incidence small-angle X-ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.
引用
收藏
页码:2295 / 2298
页数:4
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