Cycloaddition reaction of furan with Si(100)-2x1

被引：30
|
作者：
Qiao, MH
Tao, F
Cao, Y
Li, ZH
Dai, WL
Deng, JF
Xu, GQ
机构：
[1] Natl Univ Singapore, Dept Chem, Singapore 119260, Singapore
[2] Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China
来源：
JOURNAL OF CHEMICAL PHYSICS | 2001年 / 114卷 / 06期
关键词：
D O I：
10.1063/1.1338477
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The adsorption configuration of furan on Si(100)-2x1 at 125 K has been investigated using x-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), high resolution electron energy loss spectroscopy (HREELS), and semiempirical molecular orbital (MO) calculation. A chemisorbed furan species is identified, which does not desorb until 300 K. Our results clearly demonstrate the covalent attachment of furan onto Si(100), possibly through a [4+2] cycloaddition reaction. Based on the frontier molecular orbital (FMO) theory and work function measurements, an electron donation mechanism from furan to Si(100)-2x1 is proposed to be involved in the cycloaddition reaction. (C) 2001 American Institute of Physics.
引用
收藏
页码：2766 / 2774
页数：9
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