Functionally graded TiN/TiNi shape memory alloy films

被引：191
作者：
Fu, YQ [1 ]
Du, HJ [1 ]
Zhang, S [1 ]
机构：
[1] Nanyang Technol Univ, Micromachines Ctr, Sch Mech & Prod Engn, Singapore 639798, Singapore
来源：
MATERIALS LETTERS | 2003年 / 57卷 / 20期
关键词：
TiNi; thin films; TiN; sputtering; shape memory;
D O I：
10.1016/S0167-577X(02)01419-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The presence of an adherent and hard TiN layer (200 nm) on TiNi-based shape memory alloy (SMA) film (3.5 mum) formed a passivation layer, improved hardness and tribological properties, without sacrificing the phase transformation and shape memory effect of the TiNi film. (C) 2002 Elsevier Science B.V. All rights reserved.
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页码：2995 / 2999
页数：5
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