Magnetic micromechanical structures based on CoNi electrodeposited alloys

Electrodeposited CoNi magnetic microstructures compatible with silicon microfabrication technology have been developed using a sulfamate acidic bath, as an alternative to a less environmentally friendly chloride bath. The galvanostatic electrodeposition in the formulated electrolyte allows the deposition of cobalt-rich CoNi films and microstructures defined by photoresist at high deposition rates. Microstructures are adherent to the substrate, with a good lateral definition and resistance to the wet etching for the release of the sacrificial layer. The released structures respond to applied magnetic fields and no breakage occurred during large deformation.