Exploring the effect on the columnar structure and porosity of the synthesized Be films by oblique angle deposition in magnetron sputtering

A Kinetic Monte Carlo (KMC) simulation regarding the growth mechanism of oblique angle deposited Be film using magnetron sputtering was performed. We have analyzed the columnar nanostructure, layer density and porosity of generated film under the effect of incident angle and working pressure. Our results suggest that the incident angle of 60 degrees is a demarcation point for the film morphology-the particle number captured by the substrate and the film porosity increase as the working pressure increases when the incident angle is below 60 degrees, while the trend is in the opposite direction when the incident angle varies in the range of 60 degrees-90 degrees. Furthermore, we find that the increasing pressure can work on the decrease of the porosity in film under large angle deposition. The findings indicate that it is feasible to obtain Be film with specific columnar structures and porosity, which has theoretical significance on the experimental preparation of Be films.