Status of the growth and fabrication of AlGaN-based UV laser diodes for near and mid-UV wavelength

被引:25
作者
Kirste, Ronny [1 ,2 ]
Sarkar, Biplab [1 ,3 ]
Reddy, Pramod [1 ,2 ]
Guo, Qiang [1 ]
Collazo, Ramon [1 ]
Sitar, Zlatko [1 ]
机构
[1] North Carolina State Univ, Dept Mat Sci & Engn, Box 7907, Raleigh, NC 27695 USA
[2] Adroit Mat, Cary, NC USA
[3] Indian Inst Technol, Dept Elect & Commun Engn, Roorkee 247667, Uttarakhand, India
基金
美国国家科学基金会;
关键词
Laser; Optoelectronic; Electrical properties; Optical properties; Dopant; RESONANCE RAMAN-SPECTROSCOPY; CONTINUOUS-WAVE OPERATION; BULK ALUMINUM NITRIDE; LIGHT-EMITTING-DIODES; MG-DOPED GAN; STIMULATED-EMISSION; OHMIC CONTACTS; ELECTRICAL-PROPERTIES; ALN/ALGAN SUPERLATTICES; ALN/SAPPHIRE TEMPLATES;
D O I
10.1557/s43578-021-00443-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this article, the development of mid-UV laser diodes based on the AlGaN materials system is reviewed. The targeted wavelength for these lasers covers the range from 200 to 350 nm. After introducing UV laser diodes and explaining their applications, the challenges in growth, design, and fabrication are discussed. In addition, recent results from optically and electrically injected UV laser diodes are presented. Finally, we will discuss possible pathways to improve performance and give an outlook on the expected development of UV laser diodes in the near future.
引用
收藏
页码:4638 / 4664
页数:27
相关论文
共 228 条
[81]   Epitaxial lateral overgrowth techniques used in group III nitride epitaxy [J].
Hiramatsu, K .
JOURNAL OF PHYSICS-CONDENSED MATTER, 2001, 13 (32) :6961-6975
[82]   Fabrication and characterization of low defect density GaN using facet-controlled epitaxial lateral overgrowth (FACELO) [J].
Hiramatsu, K ;
Nishiyama, K ;
Onishi, M ;
Mizutani, H ;
Narukawa, M ;
Motogaito, A ;
Miyake, H ;
Iyechika, Y ;
Maeda, T .
JOURNAL OF CRYSTAL GROWTH, 2000, 221 (1-4) :316-326
[83]   Recent progress and future prospects of AlGaN-based high-efficiency deep-ultraviolet light-emitting diodes [J].
Hirayama, Hideki ;
Maeda, Noritoshi ;
Fujikawa, Sachie ;
Toyoda, Shiro ;
Kamata, Norihiko .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (10)
[84]   Marked Enhancement in the Efficiency of Deep-Ultraviolet AlGaN Light-Emitting Diodes by Using a Multiquantum-Barrier Electron Blocking Layer [J].
Hirayama, Hideki ;
Tsukada, Yusuke ;
Maeda, Tetsutoshi ;
Kamata, Norihiko .
APPLIED PHYSICS EXPRESS, 2010, 3 (03)
[85]   222-282 nm AlGaN and InAlGaN-based deep-UV LEDs fabricated on high-quality AlN on sapphire [J].
Hirayama, Hideki ;
Fujikawa, Sachie ;
Noguchi, Norimichi ;
Norimatsu, Jun ;
Takano, Takayoshi ;
Tsubaki, Kenji ;
Kamata, Norihiko .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2009, 206 (06) :1176-1182
[86]   Low-resistance ohmic contacts to p-type GaN achieved by the oxidation of Ni/Au films [J].
Ho, JK ;
Jong, CS ;
Chiu, CC ;
Huang, CN ;
Shih, KK ;
Chen, LC ;
Chen, FR ;
Kai, JJ .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (08) :4491-4497
[87]   Fluorescence analysis of dissolved organic matter in natural, waste and polluted waters - A review [J].
Hudson, Naomi ;
Baker, Andy ;
Reynolds, Darren .
RIVER RESEARCH AND APPLICATIONS, 2007, 23 (06) :631-649
[88]   350.9 nm UV laser diode grown on low-dislocation-density AlGaN [J].
Iida, K ;
Kawashima, T ;
Miyazaki, A ;
Kasugai, H ;
Mishima, S ;
Honshio, A ;
Miyake, Y ;
Iwaya, M ;
Kamiyama, S ;
Amano, H ;
Akasaki, I .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (4A) :L499-L500
[89]   Onset of a quantum phase transition with a trapped ion quantum simulator [J].
Islam, R. ;
Edwards, E. E. ;
Kim, K. ;
Korenblit, S. ;
Noh, C. ;
Carmichael, H. ;
Lin, G. -D. ;
Duan, L. -M. ;
Wang, C. -C. Joseph ;
Freericks, J. K. ;
Monroe, C. .
NATURE COMMUNICATIONS, 2011, 2
[90]   ULTRAFINE POWDERS OF TIN AND ALN PRODUCED BY A REACTIVE GAS EVAPORATION TECHNIQUE WITH ELECTRON-BEAM HEATING [J].
IWAMA, S ;
HAYAKAWA, K ;
ARIZUMI, T .
JOURNAL OF CRYSTAL GROWTH, 1982, 56 (02) :265-269