Nonradiative relaxation times in diagonal transition Si/SiGe quantum cascade structures

被引:21
作者
Bormann, I [1 ]
Brunner, K
Hackenbuchner, S
Abstreiter, G
Schmult, S
Wegscheider, W
机构
[1] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
[2] Univ Regensburg, Inst Angew & Expt Phys, D-93040 Regensburg, Germany
关键词
D O I
10.1063/1.1631381
中图分类号
O59 [应用物理学];
学科分类号
摘要
Here, we explore experimentally and theoretically the possibility to prolong the upper hole state nonradiative lifetime of Si/SiGe quantum cascade (QC) structures by using a spatially indirect diagonal transition between two SiGe quantum well ground states. With the recent observation of well resolved midinfrared electroluminescence from heavy hole intersubband transitions in Si/SiGe valence-band QC structures, a Si-based QC laser seems no longer to be out of reach. A long carrier lifetime and maybe population inversion, however, appear to be impossible for structure designs with a vertical intersubband transition studied so far. This is due to the nonresonant behavior of deformation potential scattering dominant in unipolar SiGe. We report on calculations of the band structure using a six-band k.p model and of hole deformation potential scattering that predict significantly increased nonradiative lifetimes for large barrier thickness, reaching about 20 ps for 35 A Si barrier layer width. Electroluminesence measurements of a series of QC structures with varied barrier width reveal comparable efficiencies and the deduced lifetimes confirm our model calculations. (C) 2003 American Institute of Physics.
引用
收藏
页码:5371 / 5373
页数:3
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