Fabrication of Thiol-Functionalized Ni-Doped ZnO Thin Films for Room-Temperature Ferromagnetism

被引：3
作者：
Nallusamy, Sivanantham [1 ]
Nammalvar, Gopalakrishnan [1 ]
机构：
[1] Natl Inst Technol, Dept Phys, Thin Film Lab, Tiruchirappalli 620015, Tamil Nadu, India
来源：
IEEE MAGNETICS LETTERS | 2017年 / 8卷
关键词：
Magnetochemistry; ferromagnetism; Ni-doped ZnO thin film; thiol functionalization; MAGNETIC-PROPERTIES; ARRAYS;
D O I：
10.1109/LMAG.2017.2753177
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Ferromagnetism in Ni-doped (3, 5, and 7 mol%) ZnO thin film has been enhanced by an approach that alters the electronic configuration of ZnO by surface functionalization (capping) with organic molecules. Dodecane thiol was used as a functionalization agent to enhance ferromagnetism in Ni-doped ZnO thin films grown by RF magnetron sputtering. The hexagonal wurtzite structure of ZnO was confirmed by X-ray diffraction analysis. The crystallite size decreases till 5 mol% Ni and then decreases further with the increase of Ni concentration. The pulsed laser emission intensity at 2.7 eV reveals the presence of oxygen vacancies, which actually mediate ferromagnetism in Ni2+-doped ZnO thin films. This green emission further shifted to 2.73 eV upon thiol capping. The saturation magnetization 6.70, 12.09, and 9.59 emu/cm(3) obtained for 3, 5, and 7 mol% Ni-doped ZnO thin films, respectively, is enhanced to 6.92, 13.24, and 11.27 emu/cm(3) by thiol functionalization. The presence of a Zn-S bond in the X-ray photoelectron spectroscopy spectrum reveals the formation of a surface layer between the Zn and S atoms, which could be the reason for the enhanced ferromagnetism.
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页数：4
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