Wide-band emissions from highly stacked quantum dot structure grown using the strain-compensation technique

被引:12
作者
Akahane, Kouichi [1 ]
Yamamoto, Naokatsu [1 ]
机构
[1] Natl Inst Informat & Commun Technol NICT, Koganei, Tokyo 1848795, Japan
关键词
Nanostructures; Molecular beam epitaxy; Semiconducting III-V materials; TEMPERATURE; LASER;
D O I
10.1016/j.jcrysgro.2010.12.037
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We developed a new scheme using modulated stacking of self-assembled InAs QDs on InP(3 1 1)B substrates with strain compensation to fabricate QDs in order to expand the potential bandwidths of QD active regions. A highly stacked QD structure was fabricated by the strain-compensation technique with no degradation of structural and optical qualities. The full-width at half-maximum of the photoluminescence of QDs is expanded to 240 nm in the modulated stacking structure. Carrier transfer from the small QD layer to the large QD layer was observed in the stacking structure with a thin spacer layer. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:154 / 157
页数:4
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