Change of Crystallographic Orientation Characteristics of (001)-Oriented Electrodeposited Silver Films during Self-Annealing at Room Temperature

被引:1
|
作者
Hayashi, Yumi [1 ]
Shohji, Ikuo [1 ]
Koyama, Shinji [1 ]
Miyazawa, Hiroshi [2 ]
机构
[1] Gunma Univ, Grad Sch Sci & Technol, 1-5-1 Tenjin Cho, Kiryu, Gunma 3768515, Japan
[2] DOWA METALTECH Co Ltd, 1781 Nitte, Honjo 3670002, Japan
来源
ADVANCES IN MATERIAL & PROCESSING TECHNOLOGIES CONFERENCE | 2017年 / 184卷
关键词
Electrodeposited silver film; Self-annealing; Electron back scatter diffraction patterns; In situ observation; Crystal orientation;
D O I
10.1016/j.proeng.2017.04.148
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Self-annealing behaviors of the electrodeposited silver films which preferentially orient in the (001) direction were investigated by in situ EBSD analysis. Self-annealing started in storage for a few hours at room temperature (R. T.) and was almost complete after storage for 6 h at R. T. In the initial stage of self-annealing, recrystallization of (001)-oriented grains progressed with the formation of twins with (212) orientation. Membrane stress in the as-electrodeposited film was compression stress of approximately 20 MPa. The compression membrane stress seems to become driving force for self-annealing of the (001)-oriented electrodeposited silver film. Membrane stress in the film changed from compression stress to tensile stress by recrystallization in self-annealing. (C) 2017 The Authors. Published by Elsevier Ltd.
引用
收藏
页码:725 / 731
页数:7
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