Embedded iron nano-clusters prepared by Fe ion implantation and GMR property

被引：0

作者：

Hayashi, N ^{[1
]}

Sakamoto, I ^{[1
]}

Okada, T ^{[1
]}

Tanoue, H ^{[1
]}

Hirai, T ^{[1
]}

Wakabayashi, H ^{[1
]}

Toriyama, T ^{[1
]}

机构：

[1] Hosei Univ, Res Ctr Ion Beam Technol, Tokyo 1848584, Japan

来源：

2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS | 2000年

关键词：

D O I：

暂无

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

Magnetization and magnetoresistance were studied in iron-ion-implanted aluminum oxide crystals. The implantation was done to a dose of 2 x 10(17) ions/cm(2) with ion energy of 100 keV. We have observed a magnetoresistance ratio of 6.0 % at the field of H = 12 kOe. Conversion electron h Mossbauer spectroscopy and magnetization measurement show that most of the implanted ions precipitate as alpha -Fe clusters with a few nm size in radii; the spectra reveals the clusters in both superparamagentic and ferromagnetic states. To study the process of the nano-crystalline formation Fe-57 ions as Mossbauer probes were partially implanted for the fluence of 2 x 10(17) ions/cm(2).

引用

页码：781 / 784

页数：4

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