Design and testing of a compliant mechanism-based XYθ stage for micro/nanopositioning

被引:0
作者
Banumurthy, S. P. [1 ]
Bharanidaran, R. [1 ]
机构
[1] Vellore Inst Technol, Sch Mech Engn, Vellore, Tamil Nadu, India
关键词
Compliant mechanism; micro/nano manipulation; positioning; parameterisation; FEM; OPTIMIZATION; MICROMANIPULATOR; SERVO;
D O I
10.1080/14484846.2020.1786653
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
A compliant mechanism-based micro/nanopositioning stages are used to perform high precision motion in various fields. In recent years, researches proposed various methods to achieve the compliant mechanism. This article presents a design of XY theta micropositioning stage using parametrisation technique. Conceptual design of positioning stage is developed using a combination of simple four bars. This can take a single load for angular displacement of one side or double loading for linear displacement. All the four sides of the stage can take loads depending on the direction of displacement. Conceptual design is converted into a working model using a parameterisation technique in which geometrical parameter is determined. Numerical simulations are performed for single loading and double loading to estimate x, y and theta. A working model is fabricated using a wire EDM process and has been tested for actual and numerical results.
引用
收藏
页码:1185 / 1194
页数:10
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