Performance on GaN-Based Light-Emitting Diodes with Different Substrate Tilt Angles

被引:3
作者
Liou, Jian-Kai [1 ]
Liu, Yi-Jing [1 ]
Cheng, Shiou-Ying [2 ]
Chou, Po-Cheng [1 ]
Chen, Chiun-Chia [1 ]
Liu, Wen-Chau [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, 1 Univ Rd, Tainan 70101, Taiwan
[2] Natl Ilad Univ, Dept Elect Engn, Yilan 206, Taiwan
来源
FRONTIER OF NANOSCIENCE AND TECHNOLOGY | 2011年 / 694卷
关键词
GaN; electrostatic discharge (ESD); capacitance; ESD CHARACTERISTICS; FILMS; LEDS;
D O I
10.4028/www.scientific.net/MSF.694.842
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The electrostatic discharge (ESD) performance of GaN-based light-emitting diodes (LEDs) with naturally-textured p-GaN contact layers grown on c-axis miscut sapphire substrates are studied. During machine model tests, the device grown on a 0.35 degrees miscut sapphire shows the highest ESD tolerance, while the one grown on a 0.2 degrees miscut sapphire exhibits the poorest tolerance. It is discovered that this effect correlates with the presence of maximum capacitance (C-m) values, over the difference in defect densities between LEDs. The variation in C-m values is caused by parasitic capacitance effect induced by different p-GaN surface morphologies between the studied devices. This observation gives us more reliable application in improving ESD performance based on the device grown on a 0.35 degrees miscut sapphire.
引用
收藏
页码:842 / +
页数:2
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