Nanocrystalline gradient films through chemical vapor synthesis

被引：30

作者：

Seifried, S ^{[1
]}

Winterer, M ^{[1
]}

Hahn, H ^{[1
]}

机构：

[1] Darmstadt Univ Technol, Dept Mat Sci, Thin Films Div, D-64287 Darmstadt, Germany

来源：

SCRIPTA MATERIALIA | 2001年 / 44卷 / 8-9期

关键词：

chemical vapor deposition (CVD); functionally graded materials (FGM); composite; ceramics; microstructure;

D O I：

10.1016/S1359-6462(01)00898-3

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thick ceramic films in the systems TiO2 and Ti-O-Si consisting of nanocrystalline grains between 15 and 45 nm are prepared by a modified Chemical Vapor Deposition (CVD) method; the Chemical Vapor Synthesis (CVS). Film formation iri performed under helium flow in a hot wall reactor by pyrolysis of metal-organic compounds silicon substrates. One-dimensional gradients of composition are achieved by adjusting precursor massflows; gradients of microstructure are obtained by variation the reactor temperature during the process. The influence of process parameters; specifically temperature and precursor flow examined. The microstructure evolves from columnar grains; Typical for CVD; To nanocrystalline grains creating an increasing porosity normal to the substrate. (C) 2001 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.

引用

页码：2165 / 2168

页数：4