Soft breakdown on deep sub-micrometer RF nMOSFET performance

被引：0
|
作者：
Liu, Y [1 ]
Sadat, A [1 ]
Yuan, JS [1 ]
Yang, H [1 ]
机构：
[1] Univ Cent Florida, Sch Elect Engn & Comp Sci, Orlando, FL 32816 USA
来源：
EDMO2003: 11TH IEEE INTERNATIONAL SYMPOSIUM ON ELECTRON DEVICES FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS | 2003年
关键词：
soft break-down; gate capacitance; analytical equation of cut-off frequency; LC oscillator; oscillation frequency;
D O I：
10.1109/EDMO.2003.1260006
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Soft Breakdown stress on CMOS RF devices has been examined. The total gate capacitance decreases with stress. The analytical equation of cut-off frequency including the gate oxide breakdown is derived. The effect of soft break-down on the performance of an LC oscillator is examined The oscillation frequency of the LC oscillator increases after soft break-down stress.
引用
收藏
页码：122 / 127
页数：6
相关论文
共 50 条
  • [1] A deep sub-micrometer NMOSFET non-local transport model for ESD effect
    Zhu Zhi-Wei
    Hao Yue
    Zhang Jin-Feng
    Fang Jian-Ping
    Liu Hong-Xia
    ACTA PHYSICA SINICA, 2006, 55 (11) : 5878 - 5884
  • [2] Model of hot-carrier induced degradation in ultra-deep sub-micrometer nMOSFET
    Lei Xiao-Yi
    Liu Hong-Xia
    Zhang Yue
    Ma Xiao-Hua
    Hao Yue
    CHINESE PHYSICS B, 2014, 23 (05)
  • [3] Model of hot-carrier induced degradation in ultra-deep sub-micrometer nMOSFET
    雷晓艺
    刘红侠
    张月
    马晓华
    郝跃
    Chinese Physics B, 2014, (05) : 529 - 533
  • [4] Sub-micrometer soft lithography of a bulk chalcogenide glass
    Kohoutek, Tomas
    Orava, Jiri
    Greer, A. Lindsay
    Fudouzi, Hiroshi
    OPTICS EXPRESS, 2013, 21 (08): : 9584 - 9591
  • [5] Characterization and Modeling of Breakdown Probability in Sub-Micrometer CMOS SPADs
    Pancheri, Lucio
    Stoppa, David
    Betta, Gian-Franco Dalla
    IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2014, 20 (06) : 328 - 335
  • [6] Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask
    Wu, Chun-Ying
    Hsieh, Heng
    Lee, Yung-Chun
    MICROMACHINES, 2019, 10 (08)
  • [7] Evaporation of a sub-micrometer droplet
    Babin, V
    Holyst, R
    JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (22): : 11367 - 11372
  • [8] Poly gate depletion effect on deep sub-micrometer CMOS
    Ye, QY
    Limb, Y
    Berry, W
    Li, YJ
    Thanh, LD
    Rengarajan, R
    Tonti, W
    ULSI PROCESS INTEGRATION, 1999, 99 (18): : 301 - 310
  • [9] Soft X-ray holographic microscopy with sub-micrometer resolution
    Jiang, S.P.
    Zhang, Y.X.
    Gao, H.Y.
    Zhang, X.Y.
    Chen, M.
    Chen, J.W.
    Xu, Z.Z.
    Chinese Journal of Lasers B (English Edition), 2001, 10 (02): : 127 - 130
  • [10] Numerical characterization of local electrical breakdown in sub-micrometer metallized film capacitors
    Jiang, Wei
    Zhang, Ya
    Bogaerts, Annemie
    NEW JOURNAL OF PHYSICS, 2014, 16
12345