PHOTO-FENTON TREATMENT OF CI REACTIVE BLACK 5 BY USE OF RESPONSE SURFACE METHODOLOGY

Degradation of a diazo dye of C I Reactive Black 5 by photo- Fenton process has been investigated Response surface methodology was applied to evaluate the interactive effects of process variables considered as initial concentration of dye, H2O2 and Fe2+ on the process efficiency in terms of % COD removal, and to optimize the process Experimental design using central composite design allowed the development of a second-order model for RB5 degradation The experimental results satisfactorily fitted the model predictions The optimum reaction conditions to obtain maximum % COD removal were found to be 13 236 mM H2O2 0 5 mM Fe2+ and 0 1008 mM RB5 The results suggest that photo- Fenton process is a promising solution for the degradation of RB5 under both UV and sunlight