High-Gain Gated Lateral Power Bipolar Junction Transistor

被引:4
|
作者
Wang, Jia [1 ,2 ]
Xie, Ya-Hong [1 ]
Amano, Hiroshi [3 ]
机构
[1] Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90024 USA
[2] Nagoya Univ, Dept Elect, Grad Sch Engn, Nagoya, Aichi 4648603, Japan
[3] Nagoya Univ, Inst Mat & Syst Sustainabil, Nagoya, Aichi 4648601, Japan
关键词
Bipolar transistors; gain; gallium nitride; MOSFET; power semiconductor devices; silicon carbide; 4H-SIC BJTS; OPERATION; GAN;
D O I
10.1109/LED.2021.3099982
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrated a prototype Gated Lateral power bipolar junction transistor (GLP-BJT) on wide bandgap semiconductor. The device combined the intrinsic advantages of high current gain of a Gated Lateral-BJT and good current handling and voltage blocking capabilities of GaN material. As a result, the common-emitter current gain remained over 300 at a high collector current density of 2 kA/cm(2) despite a wide p- base region of 2 mu m. The open base breakdown voltageBVCEO was over 300 V corresponding to a high critical field of 2.5MV/cm. These figures ofmerit show great promise of GaN-based GLP-BJT in power applications and also shed light on the development of stateof- the-art bipolar transistors based on other wide bandgap semiconductors.
引用
收藏
页码:1370 / 1373
页数:4
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