Level-set strategy for inverse DSA-lithography

We introduce a level-set strategy to find the geometry of confinement that will guide the self-assembly of block copolymers to a given target design in the context of lithography. The methodology is based on a shape optimization algorithm, where the level-set normal velocity is defined as the pressure field computed through a self-consistent field theory simulation. We present numerical simulations that demonstrate that this methodology is capable of finding guiding templates for a variety of target arrangements of cylinders and thus is an effective approach to the inverse directed self-assembly problem. (C) 2018 Elsevier Inc. All rights reserved.