Milliwatt power 270 nm-band AlGaN deep-UV LEDs fabricated on ELO-AlN templates

被引:23
作者
Hirayama, Hideki [1 ,2 ,3 ]
Norimatsu, Jun [1 ,2 ,3 ]
Noguchi, Norimichi [1 ,2 ,3 ]
Fujikawa, Sachie [1 ,2 ,3 ]
Takano, Takayoshi [1 ,4 ]
Tsubaki, Kenji [1 ,4 ]
Kamata, Norihiko [2 ,3 ]
机构
[1] RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan
[2] Saitama Univ, Sakura Ku, Saitama, Saitama 3888570, Japan
[3] JST, CREST, Kawaguchi, Saitama 3220012, Japan
[4] Matsushita Elect Works Ltd, Osaka 5718686, Japan
来源
PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, SUPPL 2 | 2009年 / 6卷
关键词
LIGHT-EMITTING-DIODES; LOW-DISLOCATION-DENSITY; VAPOR-PHASE EPITAXY; SUPERLATTICE; OPERATION; SAPPHIRE; EMISSION;
D O I
10.1002/pssc.200880959
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrated CW milliwatt power operations of 270 nm-band AlGaN multi-quantum well (MQW) deep-ultraviolet (DUV) light-emitting diodes (LEDs) fabricated on epitaxial lateral overgrowth (ELO) AlN templates on sapphire. An initial AlN stripe layer was grown directly on sapphire by using ammonia (NH3) pulse-flow multilayer (ML) growth method. An AlN stripe structure with a width of 5 mu m and a spacing of 3 mu m was completely coalesced after the growth of an approximately 15 mu m-thick ELO-AlN layer grown by low-pressure metal-organic chemical vapor deposition (LP-MOCVD). The edge-type threading dislocation density (TDD) of the wing region of the ELO-AlN layer was 3x10(8) cm(-2), as observed by cross-sectional transmission electron microscope (TEM) image. The maximum output power of 2.7 mW was obtained from an AlGaN MQW LED with emission wavelength at 273 nm fabricated on ELO-AlN template under room temperature (RT) CW operation. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:S474 / S477
页数:4
相关论文
共 19 条
[1]   250 nm AlGaN light-emitting diodes [J].
Adivarahan, V ;
Sun, WH ;
Chitnis, A ;
Shatalov, M ;
Wu, S ;
Maruska, HP ;
Khan, MA .
APPLIED PHYSICS LETTERS, 2004, 85 (12) :2175-2177
[2]   Robust 290 nm emission light emitting diodes over pulsed laterally overgrown AlN [J].
Adivarahan, Vinod ;
Fareed, Qhalid ;
Islam, Monirul ;
Katona, Thomas ;
Krishnan, Balakrishnan ;
Khan, Asif .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2007, 46 (36-40) :L877-L879
[3]   AlGaN/GaN quantum well ultraviolet light emitting diodes [J].
Han, J ;
Crawford, MH ;
Shul, RJ ;
Figiel, JJ ;
Banas, M ;
Zhang, L ;
Song, YK ;
Zhou, H ;
Nurmikko, AV .
APPLIED PHYSICS LETTERS, 1998, 73 (12) :1688-1690
[4]   Quaternary InAlGaN-based high-efficiency ultraviolet light-emitting diodes [J].
Hirayama, H .
JOURNAL OF APPLIED PHYSICS, 2005, 97 (09)
[5]   High-efficiency 352 nm quaternary InAlGaN-based ultraviolet light-emitting diodes grown on GaN substrates [J].
Hirayama, H ;
Akita, K ;
Kyono, T ;
Nakamura, T ;
Ishibashi, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (10A) :L1241-L1243
[6]   227 nm AlGaN light-emitting diode with 0.15 mW output power realized using a thin quantum well and AIN buffer with reduced threading dislocation density [J].
Hirayama, Hideki ;
Noguchi, Norimichi ;
Yatabe, Tohru ;
Kamata, Norihiko .
APPLIED PHYSICS EXPRESS, 2008, 1 (05) :0511011-0511013
[7]   226-273 nm AlGaN deep-ultraviolet light-emitting diodes fabricated on multilayer AlN buffers on sapphire [J].
Hirayama, Hideki ;
Yatabe, Tohru ;
Noguchi, Norimichi ;
Ohashi, Tomoaki ;
Kamata, Norihiko .
PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 9, 2008, 5 (09) :2969-+
[8]   231-261 nm AlGaN deep-ultraviolet light-emitting diodes fabricated on AlN multilayer buffers grown by ammonia pulse-flow method on sapphire [J].
Hirayama, Hideki ;
Yatabe, Tohru ;
Noguchi, Norimichi ;
Ohashi, Tomoaki ;
Kamata, Norihiko .
APPLIED PHYSICS LETTERS, 2007, 91 (07)
[9]   High-efficiency AlGaN based UV emitters grown on high-crystalline-quality AlGaN using grooved AlN layer on sapphire substrate [J].
Iida, K. ;
Watanabe, H. ;
Takeda, K. ;
Nagai, T. ;
Sumii, T. ;
Nagamatsu, K. ;
Kawashima, T. ;
Balakrishnan, K. ;
Iwaya, M. ;
Kamiyama, S. ;
Amano, H. ;
Akasaki, I. ;
Bandoh, A. .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2007, 204 (06) :2000-2004
[10]   350.9 nm UV laser diode grown on low-dislocation-density AlGaN [J].
Iida, K ;
Kawashima, T ;
Miyazaki, A ;
Kasugai, H ;
Mishima, S ;
Honshio, A ;
Miyake, Y ;
Iwaya, M ;
Kamiyama, S ;
Amano, H ;
Akasaki, I .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (4A) :L499-L500