Neural networks in semiconductor manufacturing process
被引:0
作者:
Siddiqui, AS
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机构:
Jamia Millia Islamia, Dept Elect Engn, New Delhi 110025, IndiaJamia Millia Islamia, Dept Elect Engn, New Delhi 110025, India
Siddiqui, AS
[1
]
Moinuddin
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h-index: 0
机构:
Jamia Millia Islamia, Dept Elect Engn, New Delhi 110025, IndiaJamia Millia Islamia, Dept Elect Engn, New Delhi 110025, India
Moinuddin
[1
]
Ibraheem
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h-index: 0
机构:
Jamia Millia Islamia, Dept Elect Engn, New Delhi 110025, IndiaJamia Millia Islamia, Dept Elect Engn, New Delhi 110025, India
Ibraheem
[1
]
机构:
[1] Jamia Millia Islamia, Dept Elect Engn, New Delhi 110025, India
来源:
PHYSICS OF SEMICONDUCTOR DEVICES, VOLS 1 AND 2
|
1998年
/
3316卷
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D O I:
暂无
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
This paper is aimed to discuss the suitability of the application of Artificial Neural Networks (ANNs) in the industrial manufacturing processes, special emphasis is on manufacturing of semiconductor devices. The fabrication of Integrated Circuits (ICs) and related devices is very expensive and complex process. The cost involved in high volume manufacturing of ICs and devices has been increasing continuously. If this trend continues at its present rate, only very few companies can sustain to meet the requirement of technological innovation in actual fabrication processes, if has become necessary to develop or introduce newer technology to modify manufacturing methods which are equally cost effective.