High resolution Laplace deep level transient spectroscopy studies of electron and hole traps in n-type GaN

被引:3
作者
Emiroglu, D. [1 ]
Evans-Freeman, J. [1 ]
Kappers, M. J. [2 ]
McAleese, C. [2 ]
Humphreys, C. J. [2 ]
机构
[1] Sheffield Hallam Univ, Mat & Engn Res Inst, Sheffield S1 1WB, S Yorkshire, England
[2] Univ Cambridge, Dept Mat Sci & Metallurgy, Cambridge CB2 1TN, England
来源
PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 6 | 2008年 / 5卷 / 06期
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1002/pssc.200778408
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Deep Level Transient Spectroscopy (DLTS) and Laplace DLTS (LDLTS) have been applied to MOVPE-grown n-type GaN, grown at 1920 degrees C on c-plane sapphire. DLTS measured up to 600 K initially recorded three peaks due to electron emission. However, when the next rate window was sampled immediately afterwards, the DLTS scan showed a large negative peak which dominated the scan at 410K. The polarity of the feature means that this is due to hole mission. An electron, trap initially present at 400 K in the DLTS spectrum gradually disappeared up to a measurement temperature of 520 K; beyond this the hole trap was observed. It then remained detectable, by DLTS for up to one week, although cooling under bias decreased its intensity severely. LDLTS reveals that this hole trap is not a simple point defect as it has three emission rates. It is discussed in the context of the V-Ga- O-N(X) defect, where different mission rates present could reflect V-Ga complexed with different numbers of O atoms.
引用
收藏
页码:1482 / +
页数:2
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