Imaging of optical field confinement in ridge waveguides fabricated on very-small-aperture laser

被引：68

作者：

Chen, F ^{[1
]}

Itagi, A

Bain, JA

Stancil, DD

Schlesinger, TE

Stebounova, L

Walker, GC

Akhremitchev, BB

机构：

[1] Carnegie Mellon Univ, Dept Elect & Comp Engn, Ctr Data Storage Syst, Pittsburgh, PA 15213 USA

[2] Univ Pittsburgh, Dept Chem, Pittsburgh, PA 15260 USA

[3] Duke Univ, Dept Chem, Durham, NC 27708 USA

来源：

APPLIED PHYSICS LETTERS | 2003年 / 83卷 / 16期

关键词：

D O I：

10.1063/1.1621088

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Optical field confinement in a ridge waveguide nanostructure ("C" aperture) designed for ultrahigh-density recording was observed using an apertureless near-field scanning optical microscope. The aperture was fabricated on a commercial edge-emitting semiconductor laser as the light source. High-contrast near-field images at both 1x and 2x lock-in detection frequencies were obtained. The emission patterns are in agreement with theoretical simulation of such structures. A 90 nmx70 nm full width half maximum spot size was measured and is comparable to the ridge width of the aperture. (C) 2003 American Institute of Physics.

引用

页码：3245 / 3247

页数：3

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