Potassium migration in silica glass during electron beam irradiation

被引：0

作者：

Jurek, K

Gedeon, O

Hulinsky, V

机构：

[1] Inst Phys AV CR, Prague 16253 6, Czech Republic

[2] Inst Chem Technol, Prague 16628 6, Czech Republic

来源：

MIKROCHIMICA ACTA | 1998年

关键词：

potassium migration; silica glass; electron beam; x-ray microanalysis;

D O I：

暂无

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Potassium glass was irradiated by 10, 30 and 50 keV electron beams of various diameters and the time decay of potassium x-radiation was measured. These measurements were complemented by SEM observation of the etched cross sections of exposed areas and potassium depth concentration profiles in order to observe structural changes in the glass. Whilst the temperature increase remained low, the length of the incubation period was inversely proportional to the specimen current density and a possible explanation of this phenomenon was suggested.

引用

页码：269 / 272

页数：4

共 12 条

[1] SOME CONSIDERATIONS ON THE ELECTRIC-FIELD INDUCED IN INSULATORS BY ELECTRON-BOMBARDMENT [J].