High electron mobility in nearly-dislocation-free hexagonal InN

被引:3
作者
Chen, Ling [1 ,2 ]
Sheng, Shanshan [1 ,2 ]
Sheng, Bowen [1 ,2 ]
Wang, Tao [3 ]
Yang, Liuyun [1 ,2 ]
Zhang, Baoqing [1 ,2 ]
Yang, Jiajia [1 ,2 ]
Zheng, Xiantong [1 ,2 ]
Chen, Zhaoying [1 ,2 ]
Wang, Ping [1 ,2 ]
Ge, Weikun [1 ,2 ]
Shen, Bo [1 ,2 ,4 ,5 ]
Wang, Xinqiang [1 ,2 ,4 ,5 ,6 ]
机构
[1] Peking Univ, Sch Phys, State Key Lab Mesoscop Phys, Beijing 100871, Peoples R China
[2] Peking Univ, Sch Phys, Frontiers Sci Ctr Nanooptoelect, Beijing 100871, Peoples R China
[3] Peking Univ, Sch Phys, Electron Microscopy Lab, Beijing 100871, Peoples R China
[4] Peking Univ, Yangtze Delta Inst Optoelect, Nantong 226010, Jiangsu, Peoples R China
[5] Peking Univ, Collaborat Innovat Ctr Quantum Matter, Sch Phys, Beijing 100871, Peoples R China
[6] Songshan Lake Mat Lab, Dongguan 523808, Peoples R China
基金
北京市自然科学基金; 中国国家自然科学基金;
关键词
InN microcrystal; high electron mobility; nearly-dislocation-free; EPITAXY; GROWTH;
D O I
10.35848/1882-0786/ac4449
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate a recorded directed-probed electron mobility of similar to 4850 cm(2) V(-1)s(-1) in nearly-dislocation-free hexagonal InN at room temperature by Hall-effect measurement. Those extremely high-quality InN are achieved through droplet-assisted epitaxy on a GaN/sapphire template by molecular beam epitaxy. They behave as crystals with a diameter of several micrometers, being confirmed to be nearly free of threading dislocation by transmission electron microscopy. The achievement of such high-mobility InN provides promising opportunities for fabricating high-speed electronic devices.
引用
收藏
页数:4
相关论文
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