On the optical constants of TiO2 thin films.: Ellipsometric studies

被引:24
作者
Mardare, D [1 ]
Stancu, A [1 ]
机构
[1] Alexandru Ioan Cuza Univ, Fac Phys, R-6600 Iasi, Romania
关键词
thin films; oxides; sputtering; X-ray diffraction; optical properties;
D O I
10.1016/S0025-5408(00)00408-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
TiO2 thin films were obtained on unheated glass substrates by a DC reactive magnetron sputtering method. The as-deposited films exhibit an amorphous structure as observed from X-ray diffraction (XRD) patterns. The structure changes to a mixed one of 70% anatase and 30% rutile after heat treatment in air in the temperature range 293-673 K. Using ellipsometric measurements, and a computer to solve the corresponding equations, a modeling technique was used to find the optical constants of the studied thin films. A sensitivity analysis was performed. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
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页码:2017 / 2025
页数:9
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