Patterning issues in superconducting nanowire single photon detector fabrication

被引：6
作者：
Constancias, C. [1 ]
de Lamaestre, R. Espiau [1 ]
Cavalier, O. Louveau P. [1 ]
Villegier, J. -C. [1 ]
机构：
[1] CEA Grenoble, MINATEC, F-38054 Grenoble, France
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2007年 / 25卷 / 06期
关键词：
D O I：
10.1116/1.2806965
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Superconducting single photon detectors (SSPD) made of superconducting NbN ultrathin film were successfully synthesized down to 70 nm nanowire width. Their fabrication process is detailed, with emphasis on electron beam lithography. A high-resolution electron beam lithography tool was operated at 100 kV in combination with a negative tone resist NEB22A2, in order to achieve the required resolution and fabrication yield. The sensitivity of ultrathin NbN films to various resist stripping treatments is evidenced by electrical transport measurements, and circumvented by deposition of adequate protecting layers. SSPDs made of a 4.4 nm thick NbN film were electrically characterized, and show a critical current density above 3x10(6) A cm(-2) and a critical temperature above 11 K. (c) 2007 American Vacuum Society.
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页码：2041 / 2044
页数：4
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