Ti3+:sapphire thin films fabricated by pulsed-laser deposition

被引:3
作者
Uetsuhara, H [1 ]
Nasu, T [1 ]
Nakata, Y [1 ]
Vasa, N [1 ]
Okada, T [1 ]
Maeda, M [1 ]
机构
[1] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Fukuoka 8128581, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 5A期
关键词
laser ablation; pulsed-laser deposition (PLD); thin film; Ti3+: sapphire; fluorescence; droplets;
D O I
10.1143/JJAP.37.2530
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ti3+:sapphire thin films were deposited on sapphire substrates by pulsed-laser deposition (PLD) process. A smoother surface was obtained at lower pressure in a chamber. Their fluorescence characteristics were confirmed and the emission characteristics comparable with the bulk Ti3+:sapphire crystal were obtained.
引用
收藏
页码:2530 / 2531
页数:2
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