Optical characterization of sol-gel deposited PZT thin films by spectroscopic ellipsometry and reflectometry in near-UV and visible regions

被引:13
作者
Franta, D
Ohlídal, I
Mistrík, J
Yamaguchi, T
Hu, GJ
Dai, N
机构
[1] Masaryk Univ, Lab Plasma Phys & Plasma Sources, Fac Sci, Brno 61137, Czech Republic
[2] Shizuoka Univ, Elect Res Inst, Hamamatsu, Shizuoka 4328011, Japan
[3] Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
关键词
PZT films; optical constants; ellipsometry; reflectometry;
D O I
10.1016/j.apsusc.2004.10.089
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper the results concerning the optical characterization of the PZT film are presented. The multi-sample modification of the optical method based on combining variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry is used to obtain the spectral dependences of the optical constants of this film within the spectral region 190-1000 nm. Within the near-UV region the sharp features of the spectral dependences of the optical constants are found. These features are explained by the existence of the narrow bands of the 4d and 3d valence electrons of the transition metals Zr and Ti. Within the optical characterization of the PZT film the defects consisting of boundary roughness and refractive index profile are respected. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:338 / 342
页数:5
相关论文
共 18 条
[1]   Growth and electrical properties of Pb(Zr,Ti)O3 thin films by a chemical solution deposition method using zirconyl heptanoate as zirconium source [J].
Bao, DH ;
Yao, X ;
Shinozaki, K ;
Mizutani, N .
JOURNAL OF CRYSTAL GROWTH, 2003, 259 (04) :352-357
[2]   PZT films deposited by a hydrothermal method and characterizations [J].
Euphrasie, S ;
Daviero-Minaud, S ;
Pernod, P .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2003, 104 (03) :180-184
[3]   Optical characterization of diamond-like carbon films using multi-sample modification of variable angle spectroscopic ellipsometry [J].
Franta, D ;
Zajícková, L ;
Ohlídal, I ;
Janca, J ;
Veltruská, K .
DIAMOND AND RELATED MATERIALS, 2002, 11 (01) :105-117
[4]   Characterization of the boundaries of thin films of TiO2 by atomic force microscopy and optical methods [J].
Franta, D ;
Ohlídal, I ;
Klapetek, P ;
Pokorny, P .
SURFACE AND INTERFACE ANALYSIS, 2002, 34 (01) :759-762
[5]   Influence of overlayers on determination of the optical constants of ZnSe thin films [J].
Franta, D ;
Ohlídal, I ;
Klapetek, P ;
Montaigne-Ramil, A ;
Bonanni, A ;
Stifter, D ;
Sitter, H .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (04) :1873-1880
[6]   Ellipsometric parameters and reflectances of thin films with slightly rough boundaries [J].
Franta, D ;
Ohlidal, I .
JOURNAL OF MODERN OPTICS, 1998, 45 (05) :903-934
[7]   The grain size effec of the Pb(Zr0.45Ti0.55)O3 thin films deposited on LaNiO3-coated silicon by modified sol-gel process [J].
Hu, SH ;
Hu, GJ ;
Meng, XJ ;
Wang, GS ;
Sun, JL ;
Guo, SL ;
Chu, JH ;
Dai, N .
JOURNAL OF CRYSTAL GROWTH, 2004, 260 (1-2) :109-114
[8]   Optical properties of PbZrxTi1-xO3 on platinized silicon by infrared spectroscopic ellipsometry [J].
Huang, ZM ;
Meng, XJ ;
Yang, PX ;
Zhang, ZH ;
Chu, JH .
APPLIED PHYSICS LETTERS, 2000, 76 (26) :3980-3982
[9]   OPTICAL-PROPERTIES OF EVAPORATED PLATINUM FILMS IN THE VACUUM ULTRAVIOLET FROM 220-A TO 150-A [J].
HUNTER, WR ;
ANGEL, DW ;
HASS, G .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1979, 69 (12) :1695-1699
[10]   Atomic force microscopy analysis of statistical roughness of GaAs surfaces originated by thermal oxidation [J].
Klapetek, P ;
Ohlídal, I ;
Navrátil, K .
MICROCHIMICA ACTA, 2004, 147 (03) :175-180