Numerical study of Ar/CF4/N2 discharges in single- and dual-frequency capacitively coupled plasma reactors

被引:104
作者
Georgieva, V [1 ]
Bogaerts, A [1 ]
Gijbels, R [1 ]
机构
[1] Univ Antwerp, Dept Chem, UIA, B-2610 Antwerp, Belgium
关键词
D O I
10.1063/1.1603348
中图分类号
O59 [应用物理学];
学科分类号
摘要
A one-dimensional particle-in-cell/Monte Carlo model is developed to study capacitively coupled (cc) radio-frequency discharges in a gas mixture of Ar, CF4, and N-2. The charged species, which are followed in the model, are: Electrons and Ar+, CF3+, N-2(+) F-, and CF3- ions. The simulation considers electron - neutral (Ar, CF4, and, N-2) collisions, various kinds of collisions of ions with neutrals, positive-negative ion recombination, and electron-ion recombination. The model yields results for electron and ion densities, fluxes and energy distributions, collision rates and electric field, and potential distributions. The simulations are performed for a 0.8/0. 1/0.1 ratio of Ar/CF4/N-2 mixture at a pressure of 30 mTorr in single (13.56 MHz) and dual frequency (2+27 MHz) cc reactors and a comparison between the two frequency regimes is made. Results show that the structure of the discharges is electronegative in both cases. F-1 and CF3- ions are the main negative charge carriers in the single and dual frequency regime, respectively. In the presence of low-frequency (2 MHz) and a strong electric field, the light F- ions are no longer confined in the bulk plasma and they partially respond to the instantaneous electric field. The calculated electron energy probability function profiles can be approximated to a Druyvesteyn and bi-Maxwellian distribution with high-energy tails in the single- and dual-frequency regime, respectively. The ion energy distribution is narrow with one outstanding peak in the single-frequency scheme, whereas it is wide and bimodal in the dual-frequency scheme. (C) 2003 American Institute of Physics.
引用
收藏
页码:3748 / 3756
页数:9
相关论文
共 37 条
[21]   Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma [J].
Kitajima, T ;
Takeo, Y ;
Petrovic, ZL ;
Makabe, T .
APPLIED PHYSICS LETTERS, 2000, 77 (04) :489-491
[22]   Transport coefficients and scattering cross-sections for plasma modelling in CF4-Ar mixtures:: a swarm analysis [J].
Kurihara, M ;
Petrovic, ZL ;
Makabe, T .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2000, 33 (17) :2146-2153
[23]   Functional design of a pulsed two-frequency capacitively coupled plasma in CF4/Ar for SiO2 etching [J].
Maeshige, K ;
Washio, G ;
Yagisawa, T ;
Makabe, T .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (12) :9494-9501
[24]   RADIOFREQUENCY PLASMAS IN CF4 - SELF-CONSISTENT MODELING OF THE PLASMA PHYSICS AND CHEMISTRY [J].
MANTZARIS, NV ;
BOUDOUVIS, A ;
GOGOLIDES, E .
JOURNAL OF APPLIED PHYSICS, 1995, 77 (12) :6169-6180
[25]   Monte Carlo collision simulation of positive-negative ion recombination for a given rate constant [J].
Nanbu, K ;
Denpoh, K .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1998, 67 (04) :1288-1290
[26]   Electron anisotropic scattering in gases: A formula for Monte Carlo simulations [J].
Okhrimovskyy, A ;
Bogaerts, A ;
Gijbels, R .
PHYSICAL REVIEW E, 2002, 65 (03)
[27]   ANISOTROPIC SCATTERING OF ELECTRONS BY N-2 AND ITS EFFECT ON ELECTRON-TRANSPORT [J].
PHELPS, AV ;
PITCHFORD, LC .
PHYSICAL REVIEW A, 1985, 31 (05) :2932-2949
[28]   Cold-cathode discharges and breakdown in argon: surface and gas phase production of secondary electrons [J].
Phelps, AV ;
Petrovic, ZL .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (03) :R21-R44
[29]  
PHELPS AV, 1991, J PHYS CHEM REF DATA, V20, P557, DOI 10.1063/1.555889
[30]  
PHELPS AV, 1985, 26 JILA