Structural study of Si(111)(2√3 x 3√3)R30°-Sn surfaces
被引:13
作者:
Ichikawa, T
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机构:
Meiji Univ, Sch Sci & Technol, Dept Phys, Tama Ku, Kawasaki, Kanagawa 2148572, JapanMeiji Univ, Sch Sci & Technol, Dept Phys, Tama Ku, Kawasaki, Kanagawa 2148572, Japan
Ichikawa, T
[1
]
Cho, K
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h-index: 0
机构:
Meiji Univ, Sch Sci & Technol, Dept Phys, Tama Ku, Kawasaki, Kanagawa 2148572, JapanMeiji Univ, Sch Sci & Technol, Dept Phys, Tama Ku, Kawasaki, Kanagawa 2148572, Japan
Cho, K
[1
]
机构:
[1] Meiji Univ, Sch Sci & Technol, Dept Phys, Tama Ku, Kawasaki, Kanagawa 2148572, Japan
来源:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
|
2003年
/
42卷
/
08期
关键词:
Sn-induced surface structure;
surface phase transition;
high-temperature STM;
structural model;
ab initio structure relaxation;
STM image simulation;
D O I:
10.1143/JJAP.42.5239
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
In order to clarify the structure of high-temperature phase of Si(111)(2root3 x 2root3)R30degrees-Sn surfaces, in situ scanning tunneling microscopic observations were performed. The study led to important findings that the high-temperature phase is not a (1 x 1) structure but a disordered one and that the (2root3 x 2root3)R30degrees structure changes to the disordered one through a high-temperature (2root3 x 2root3)R30degrees structure newly found. A model for the (2root3 x 2root3)R30degrees structure at room temperature was proposed through an ab initio structure relaxation calculation, which can explain well the features of diffraction intensity, Paterson function and scanning tunneling images of the (2root3 x 2root3)R30degrees structure.