Integrated micro-plasmas in silicon operating in helium

被引：19

作者：

Dussart, R. ^{[1
]}

Overzet, L. J. ^{[2
]}

Lefaucheux, P. ^{[1
]}

Dufour, T. ^{[1
]}

Kulsreshath, M. ^{[1
]}

Mandra, M. A. ^{[2
]}

Tillocher, T. ^{[1
]}

Aubry, O. ^{[1
]}

Dozias, S. ^{[1
]}

Ranson, P. ^{[1
]}

Lee, J. B. ^{[2
]}

Goeckner, M. ^{[2
]}

机构：

[1] Univ Orleans, CNRS, GREMI, F-45067 Orleans 2, France

[2] Univ Texas Dallas, Plasma Sci & Applicat Lab, Richardson, TX 75080 USA

来源：

EUROPEAN PHYSICAL JOURNAL D | 2010年 / 60卷 / 03期

关键词：

MICROHOLLOW CATHODE DISCHARGES; MICRODISCHARGE ARRAYS; DEVICES; XENON; MICROPLASMAS; ARGON;

D O I：

10.1140/epjd/e2010-00272-7

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Microplasma arrays operating in helium in a DC regime have been produced in silicon microreactors. Cathode boundary layer (CBL) type microdevices were elaborated using clean room facilities and semiconductor processing techniques. Ignition of the micro-discharge arrays having either 50 or 100 m diameter cavities was studied. Two different structures (isotropically etched or anisotropically etched cavity) and various conditions (the two different voltage polarities, pressures etc.) were investigated. 100 microdischarges of 50 mu m diameter could be ignited in parallel at 1000 torr. At high current, some parasitic and transient sparks appeared at the edge of the sample. When the polarization was reversed (cathode side corresponding the opened electrode), more current was needed to light all the microdischarges. A thermally affected zone around the hole on the anode side was obtained after operation.

引用

页码：601 / 608

页数：8