Two-dimensional polymer photonic crystal band-edge lasers fabricated by nanoimprint lithography

被引：40
|
作者：
Reboud, V. [1 ]
Lovera, P.
Kehagias, N.
Zelsmann, M.
Schuster, C.
Reuther, F.
Gruetzner, G.
Redmond, G.
Sotomayor Torres, C. M.
机构：
[1] Univ Ireland Univ Coll Cork, Tyndall Natl Inst, Cork, Ireland
[2] CNRS, LTM, F-38054 Grenoble, France
[3] Micro Resist Technol GmbH, D-1255 Berlin, Germany
[4] Catalan Inst Nanotechnol, Campus Bellaterra, E-08193 Barcelona, Spain
[5] Catalan Inst Res & Adv Studies, E-08010 Barcelona, Spain
来源：
APPLIED PHYSICS LETTERS | 2007年 / 91卷 / 15期
关键词：
DISTRIBUTED-FEEDBACK;
D O I：
10.1063/1.2798250
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We report on the fabrication and characterization of two-dimensional polymer photonic crystal band-edge lasers operating in the visible range. The components have been fabricated in a dye chromophore-loaded polymer matrix by nanoimprint lithography. High-symmetry band-edge modes are used to generate laser emission. The experimental lasing frequencies are in good agreement with those calculated using a two-dimensional plane wave algorithm. These results demonstrate the potential of nanoimprint lithography for the fabrication of two-dimensional planar photonic crystal structures in an active medium in a one-step process.
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页数：3
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