Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry

被引：35
作者：
Kagias, Matias [1 ,2 ,3 ]
Wang, Zhentian [1 ,2 ,3 ]
Guzenko, Vitaliy A. [3 ]
David, Christian [3 ]
Stampanoni, Marco [1 ,2 ,3 ]
Jefimovs, Konstantins [1 ,2 ,3 ]
机构：
[1] Univ Zurich, Inst Biomed Engn, CH-8092 Zurich, Switzerland
[2] Swiss Fed Inst Technol, CH-8092 Zurich, Switzerland
[3] Paul Scherrer Inst, Swiss Light Source, CH-5232 Villigen, Switzerland
来源：
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | 2019年 / 92卷
基金：
瑞士国家科学基金会;
关键词：
X-ray interferometry; Grating fabrication; Deep reactive ion etching; Electroplating; DISPLACEMENT TALBOT LITHOGRAPHY; DIAGNOSIS;
D O I：
10.1016/j.mssp.2018.04.015
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electro-plating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3 mu m. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.
引用
收藏
页码：73 / 79
页数：7
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