Direct real-time observation of catastrophic optical degradation in operating semiconductor lasers using scanning tunneling microscopy

被引:5
作者
Cobley, R. J. [1 ]
Teng, K. S. [1 ]
Brown, M. R. [1 ]
Wilks, S. P. [1 ]
Rees, P. [1 ]
机构
[1] Univ Coll Swansea, Sch Engn, Multidisciplinary Nanotechnol Ctr, Swansea SA2 8PP, W Glam, Wales
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1063/1.2775049
中图分类号
O59 [应用物理学];
学科分类号
摘要
Cross-sectional scanning tunneling microscopy is performed on operating semiconductor quantum well laser devices to reveal real time changes in device structure. Low and nominally doped capping regions adjacent to the quantum well active region are found to heat under normal operating conditions. The increase in anion-vacancy defect formation and the generation of surface states pins the Fermi level at the surface and begins the process of catastrophic optical degradation which eventually destroys the device. The technique has implications for the study of defect generation and in-operation changes in all nanostructures. (c) 2007 American Institute of Physics.
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页数:3
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