Efficient electron-induced removal of oxalate ions and formation of copper nanoparticles from copper(II) oxalate precursor layers

被引:8
作者
Rueckriem, Kai [1 ]
Grotheer, Sarah [1 ]
Vieker, Henning [2 ]
Penner, Paul [2 ]
Beyer, Andre [2 ]
Goelzhaeuser, Armin [2 ]
Swiderek, Petra [1 ]
机构
[1] Univ Bremen, Inst Appl & Phys Chem, Fachbereich Chemie Biol 2, Leobener Str NW 2,Postfach 330440, D-28334 Bremen, Germany
[2] Univ Bielefeld, Phys Supramol Syst, D-33615 Bielefeld, Germany
关键词
copper(II) oxalate; electron-induced reactions; layer-by-layer deposition; nanoparticle formation; thin film; SELF-ASSEMBLED MONOLAYERS; BEAM-INDUCED DEPOSITION; LOW-ENERGY ELECTRONS; CARBON-DIOXIDE; SURFACE; FILMS; CO2; NANOSTRUCTURES; FABRICATION; COMPLEXES;
D O I
10.3762/bjnano.7.77
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Copper(II) oxalate grown on carboxy-terminated self-assembled monolayers (SAM) using a step-by-step approach was used as precursor for the electron-induced synthesis of surface-supported copper nanoparticles. The precursor material was deposited by dipping the surfaces alternately in ethanolic solutions of copper(II) acetate and oxalic acid with intermediate thorough rinsing steps. The deposition of copper(II) oxalate and the efficient electron-induced removal of the oxalate ions was monitored by reflection absorption infrared spectroscopy (RAIRS). Helium ion microscopy (HIM) reveals the formation of spherical nanoparticles with well-defined size and X-ray photoelectron spectroscopy (XPS) confirms their metallic nature. Continued irradiation after depletion of oxalate does not lead to further particle growth giving evidence that nanoparticle formation is primarily controlled by the available amount of precursor.
引用
收藏
页码:852 / 861
页数:10
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