Simulation and Fabrication of Large-Area 3D Nanostructures

被引:0
作者
Bogart, K. H. A. [1 ]
El-kady, I. [1 ]
Grubbs, R. K. [1 ]
Rahimian, K. [1 ]
Sanchez, A. M. [1 ]
Ellis, A. R. [1 ]
Wiwi, M. [1 ]
McCormick, F. B. [1 ]
Shir, D. J. -L.
Rogers, J. A.
机构
[1] Sandia Natl Labs, Livermore, CA 94550 USA
来源
CLEAN TECHNOLOGY 2008: BIO ENERGY, RENEWABLES, GREEN BUILDING, SMART GRID, STORAGE, AND WATER | 2008年
关键词
nanostructure; lithography; quasicrystal; photonic; model;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Three-dimensional (3D) nano-structures are vital for emerging technologies such as photonics, sensors, fuel cells, catalyst supports, and data storage. The Proximity-field nanoPatterning(1) method generates complex 3D nanostructures using a single exposure through an elastomeric "phase mask" patterned in x, y, and z, and a single development cycle. We developed a model that predicts the phase mask required to generate a specific desired nanostructure. We have compared this inverse model with experimental 3D structures to test the validity of the simulation. We have transferred the PnP fabrication process to a class-10 commercial cleanroom and scaled-up the processed area to >2000mm(2), tested photopolymer additives designed to reduce resist shrinkage, incorporated atomic layer deposition (ALD) to coat the 3D patterned resist with metals/metal-oxides improve structure robustness, and generated quasi-crystal patterned 3D nanostructures.
引用
收藏
页码:624 / 627
页数:4
相关论文
共 9 条
[1]  
Berry MV, 1996, J MOD OPTIC, V43, P2139, DOI 10.1080/09500349608232876
[2]   Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks [J].
Jeon, S ;
Park, JU ;
Cirelli, R ;
Yang, S ;
Heitzman, CE ;
Braun, PV ;
Kenis, PJA ;
Rogers, JA .
PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 2004, 101 (34) :12428-12433
[3]   Three dimensional nanoporous density graded materials formed by optical exposures through conformable phase masks [J].
Jeon, Seokwoo ;
Nam, Yun-Suk ;
Shir, Daniel Jay-Lee ;
Rogers, John A. ;
Hamza, Alex .
APPLIED PHYSICS LETTERS, 2006, 89 (25)
[4]  
Rayleigh L., 1881, PHILOS MAG, V11, P196, DOI [10.1080/14786448108626995, DOI 10.1080/14786448108626995]
[5]   Three-dimensional nanofabrication with elastomeric phase masks [J].
Shir, Daniel J. ;
Jeon, Seokwoo ;
Liao, Hongwei ;
Highland, Matthew ;
Cahill, David G. ;
Su, Mehmet F. ;
El-Kady, Ihab F. ;
Christodoulou, Christos G. ;
Bogart, Gregory R. ;
Hamza, Alex V. ;
Rogers, John A. .
JOURNAL OF PHYSICAL CHEMISTRY B, 2007, 111 (45) :12945-12958
[6]  
SU MF, 2008, IEEE PHOTON LETT
[7]  
SU MF, 2008, UNPUB
[8]  
SU MF, 2007, PHOTONIC NANOSTRUCT, V121, P1
[9]  
Talbot H. F., 1836, PHILOS MAG, V9, P401