MOCVD-grown, 1.3 μm InGaAsN multiple quantum well lasers incorporating GaAsP strain-compensation layers

被引:3
作者
Kurtz, SR [1 ]
Sieg, RM [1 ]
Allerman, AA [1 ]
Choquette, KD [1 ]
Naone, RL [1 ]
机构
[1] Sandia Natl Labs, Livermore, CA 94550 USA
来源
IN-PLANE SEMICONDUCTOR LASERS V | 2001年 / 4287卷
关键词
lasers; strain-compensation; metal-organic chemical vapor deposition;
D O I
10.1117/12.429798
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
InxGa1-xAst-yNy quaternary alloys offer the promise of longer wavelength, greater than or equal to 1.3 pm optical transceivers grown on GaAs substrates. To achieve, acceptable radiative efficiencies at 1.3 pm, highly-strained InGaAsN quantum wells (x approximate to 0.4, y approximate to 0.005) are being developed as laser active regions. By introducing GaAsP layers into the active region for strain-compensation, gain can be increased using multiple InGaAsN quantum wells. In this work, we report the first strain-compensated, 1.3 pm InGaAsN MQW lasers, Our devices were grown by metal-organic chemical vapor deposition. Lasers with InGaAsN quantum well active regions are proving superior to lasers constructed with competing active region materials. Under pulsed operation, our 1.3 pm InGaAsN lasers displayed negligible blue-shift from the low-injection LED emission, and state-of-the-art characteristic temperature (159 K) was obtained for a 1.3 mum laser.
引用
收藏
页码:170 / 175
页数:6
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