High-Performance 4H-SiC-Based Metal-Insulator-Semiconductor Ultraviolet Photodetectors With SiO2 and Al2O3/SiO2 Films

被引:10
作者
Zhang, Feng [1 ,2 ]
Sun, Guosheng [1 ,2 ]
Huang, Huolin [3 ]
Wu, Zhengyun [3 ]
Wang, Lei [2 ]
Zhao, Wanshun [2 ]
Liu, Xingfang [2 ]
Yan, Guoguo [2 ]
Zheng, Liu [2 ]
Dong, Lin [2 ]
Zeng, Yiping [1 ,2 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
[2] Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, Beijing 100083, Peoples R China
[3] Xiamen Univ, Dept Phys, Xiamen 361005, Peoples R China
关键词
Metal-insulator-semiconductor (MIS) devices; photodetectors; ultraviolet (UV) detectors; UV; PHOTODIODES;
D O I
10.1109/LED.2011.2168597
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
4H-SiC-based metal-insulator-semiconductor (MIS) ultraviolet (UV) photodetectors with thermally grown SiO2 and evaporated Al2O3/SiO2 (A/S) films are fabricated and demonstrated as normally-off and normally-on mode devices, respectively. Ultralow dark currents of 3.25 x 10(-10) and 9.75 x 10(-9) A/cm(2) and high UV-to-visible rejection ratios of > 2 x 10(3) have been achieved at 10 V. The peak responsivities of these devices were separately 30 mA/W at 260 nm and 50 mA/W at 270 nm at 10 V. These results demonstrate that S/4H-SiC and A/S/4H-SiC MIS photodetectors are promising candidates to be applied in optoelectronic integrated circuits.
引用
收藏
页码:1722 / 1724
页数:3
相关论文
共 28 条
  • [1] Metal-insulator-semiconductor-insulator-metal structure of TiO2/SiO2 Thin Films for Ultraviolet (UV) Photodetectors
    Chu, Tung-Te
    Hsiao, Yu-Jen
    Ji, Liang-Wen
    Yang, Jhih-Wei
    INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE, 2015, 10 (11): : 8951 - 8958
  • [2] Highly sensitive metal-insulator-semiconductor UV photodetectors based on ZnO/SiO2 core-shell nanowires
    Afsal, Manekkathodi
    Wang, Chiu-Yen
    Chu, Li-Wei
    Ouyang, Hao
    Chen, Lih-Juann
    JOURNAL OF MATERIALS CHEMISTRY, 2012, 22 (17) : 8420 - 8425
  • [3] AlInGaN 310 nm ultraviolet metal-insulator-semiconductor sensors with photo-chemical-vapor-deposition SiO2 cap layers
    Chen, Chin-Hsiang
    OPTICAL REVIEW, 2009, 16 (03) : 371 - 374
  • [4] Metal-Semiconductor-Metal Near-Ultraviolet (~380 nm) Photodetectors by Selective Area Growth of ZnO Nanorods and SiO2 Passivation
    Soo Hyun Lee
    Sang Hun Kim
    Jae Su Yu
    Nanoscale Research Letters, 2016, 11
  • [5] Metal-Semiconductor-Metal Near-Ultraviolet (∼380 nm) Photodetectors by Selective Area Growth of ZnO Nanorods and SiO2 Passivation
    Lee, Soo Hyun
    Kim, Sang Hun
    Yu, Jae Su
    NANOSCALE RESEARCH LETTERS, 2016, 11
  • [6] Effect of a SiO2 Anti-reflection Layer on the Optoelectronic Properties of Germanium Metal-semiconductor-metal Photodetectors
    Zumuukhorol, Munkhsaikhan
    Khurelbaatar, Zagarzusem
    Kim, Jong-Hee
    Shim, Kyu-Hwan
    Lee, Sung-Nam
    Leem, See-Jong
    Choi, Chel-Jong
    JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, 2017, 17 (04) : 483 - 491
  • [7] Optimization of HfO2, Al2O3 and SiO2 deposition leading to advanced UV optical coatings with low extinction
    Abromavicius, Giedrius
    Buzelis, Rytis
    Drazdys, Rainutis
    Perednis, Dainius
    Skrebutenas, Alfridas
    ADVANCED OPTICAL MATERIALS, TECHNOLOGIES, AND DEVICES, 2007, 6596
  • [8] Performance Improvement of SAONOS Device as UV-total-dose Nonvolatile Sensor with Al2O3/SiO2 Bilayer Blocking Oxide
    Hsieh, Wen-Ching
    Jong, Fuh-Cheng
    Tseng, Wei-Ting
    SENSORS AND MATERIALS, 2020, 32 (07) : 2303 - 2310
  • [9] Nitride-based metal-insulator-semiconductor ultraviolet sensors with a sputtered lanthanum oxide (La2O3) insulator
    Chen, Po-Chang
    Chen, Chin-Hsiang
    Tsai, Chia-Ming
    Cheng, Chung-Fu
    Wu, San-Lein
    SURFACE & COATINGS TECHNOLOGY, 2013, 231 : 328 - 331
  • [10] High-performance n - Si/p - SeO2/p - SiO2 heterojunction photodetectors for potential application in visible light communication technology
    Alharbi, Seham R. N.
    Qasrawi, A. F.
    Algarni, Sabah E.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2023, 129 (07):