Low temperature behavior of the thermopower in disordered systems near the Anderson transition

被引:6
作者
Villagonzalo, C [1 ]
Römer, RA [1 ]
机构
[1] Tech Univ, Inst Phys, D-09107 Chemnitz, Germany
关键词
thermoelectric power; localization; metal-insulator transition;
D O I
10.1002/andp.199851005-606
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We investigate the behavior of the thermoelectric power S in disordered systems close to the Anderson-type metal-insulator transition (MIT) at low temperatures. In the literature, we iind contradictory results for S. It is either argued to diverge or to remain a constant as the MIT is approached. To resolve this dilemma, we calculate the number density of electrons at the MIT in disordered systems using an averaged density of states obtained by diagonalizing the three-dimensional Anderson model of localization. From the number density we obtain the temperature dependence of the chemical potential necessary to solve for S. Without any additional approximation, we use the Chester-Thellung-Kubo-Greenwood formulation and numerically obtain the behavior of S at low T as the Anderson transition is approached from the metallic side. We show that indeed S does not diverge.
引用
收藏
页码:394 / 399
页数:6
相关论文
共 10 条
[1]   ABSENCE OF DIFFUSION IN CERTAIN RANDOM LATTICES [J].
ANDERSON, PW .
PHYSICAL REVIEW, 1958, 109 (05) :1492-1505
[2]  
Ashcroft NW., 1976, SOLID STATE PHYS
[3]   LAW OF WIEDEMANN AND FRANZ [J].
CHESTER, GV ;
THELLUNG, A .
PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1961, 77 (497) :1005-&
[4]   ELECTRON-TRANSPORT AT THE ANDERSON TRANSITION [J].
ENDERBY, JE ;
BARNES, AC .
PHYSICAL REVIEW B, 1994, 49 (07) :5062-5064
[5]   DETERMINATION OF THE MOBILITY EDGE IN THE ANDERSON MODEL OF LOCALIZATION IN 3-DIMENSIONS BY MULTIFRACTAL ANALYSIS [J].
GRUSSBACH, H ;
SCHREIBER, M .
PHYSICAL REVIEW B, 1995, 51 (01) :663-666
[6]   LOCALIZATION - THEORY AND EXPERIMENT [J].
KRAMER, B ;
MACKINNON, A .
REPORTS ON PROGRESS IN PHYSICS, 1993, 56 (12) :1469-1564
[7]   THERMOELECTRIC-POWER OF A DISORDERED METAL NEAR THE METAL-INSULATOR-TRANSITION [J].
LAKNER, M ;
VONLOHNEYSEN, H .
PHYSICAL REVIEW LETTERS, 1993, 70 (22) :3475-3478
[8]   THERMOELECTRIC-POWER AND ELECTRICAL-CONDUCTIVITY OF AMORPHOUS AUXSB100-X FILMS NEAR THE METAL-INSULATOR-TRANSITION [J].
LAUINGER, C ;
BAUMANN, F .
JOURNAL OF PHYSICS-CONDENSED MATTER, 1995, 7 (07) :1305-1314
[9]   Multifractal analysis of the metal-insulator transition in anisotropic systems [J].
Milde, F ;
Romer, RA ;
Schreiber, M .
PHYSICAL REVIEW B, 1997, 55 (15) :9463-9469
[10]   MULTICHANNEL LANDAUER FORMULA FOR THERMOELECTRIC TRANSPORT WITH APPLICATION TO THERMOPOWER NEAR THE MOBILITY EDGE [J].
SIVAN, U ;
IMRY, Y .
PHYSICAL REVIEW B, 1986, 33 (01) :551-558